The experimental prototype of a cost-effective ion-plasma technological installation comprising a plasmaoptical axially-symmetric device for manipulating ion beams, ion pre-cleaning of substrate surfaces, and an inverted cylindrical magnetron sputtering system for coating deposition on shaped parts.

Description

The use of efficient technologies of magnetron sputtering to produce new materials and coatings is worldwide practice. DC and AC planar and cylindrical magnetrons of various modifications are used to obtain functional and decorative layers. Of those, the cylindrical magnetron sputtering systems are more economic in material usage sense and more suitable for coating wires, fibers, and so on. Such sources can work with minimal losses of cathode material. Usually such devices can be efficiently used for treatment of metal targets. In some cases of treatment of non-conductive targets there is a problem of anodes placement, the anode shadow on the object. The usage of plasmaoptical principles in the cylindrical magnetron design allows to build a device with virtual anode for pressure region 10^–4–10^–2 Torr. Thus, we can produce a simple and productive source without these disadvantages. Other advantage of such design is approximately 100 % utilization of the cathode surface.

1 - magnetic system,

2 - cathodes,

3 - anode

4 - samples,

5 - holders.

Performances

The device is testing

Areas of Application

The developed ion-plasma devices allow reactive deposition of binary chemical compounds (nitrides, oxides, carbides) with nanostructures which are of interest for basic and applied investigations in nanophysics and nanotechnology, and, for example, can be used for creation of anilox rolls which are used widely in the printing and textile industries.