Nanostructured surfaces

Role of Magnetron Sputtered Nickel in Formation of sp2-bonded Carbon Nanocrystalline Films
Bogdanov R.V.1, Kostiukevych O.M1, Stubrov Y.Y.2, Yakimov K.I.1
1 Faculty of Radio Physics, Electronics and Computer Systems, Taras Shevchenko National University of Kyiv. 
64/13, Volodymirska Str., City of Kyiv, Ukraine, 01601. 
E-mail: email.of. RSemsterFX@gmail.com
2 V. Lashkaryov Institute of Semiconductor Physics of NAS of Ukraine. 
41, Nauky Avenue, Kiev, 03028 Ukraine.

Magnetron sputtering device (MSD) with two erosion zones used for sp2-bonded carbon films obtaining on Cu, CuxOx, Fe, Ni, NaCl and glass substrates at rather low substrate temperatures (363 .. 417 K), which reached by particles bombardment. For experimental carbon film deposition some optimal deposition modes were chosen from Monte Carlo (MC) computer simulation. The graphite target was supplemented by Ni or Fe plates of a catalyst with an area of 1..3 cm2. Characterizations of obtained carbon films were done by using of Raman spectroscopy (of which the sizes of nanocrystallites in films were estimated) and transmission electron microscopy (TEM), in the case of films obtained on NaCl substrates.
The biggest sizes of nanocrystallites reached in case of Ni catalyst. Also observed that Ni substrates provide more ordered sp2-bonded structure than CuxOx with G-band of Raman spectra close and more than 1580 cm-1. At sputtered Ni surface nanocrystallites sizes reached 9.6 nm. 
Also, the appearance of sp2-bonded films was observed under conditions when the energy of the sputtered carbon atoms was significantly less than the threshold value 7.04 eV [1]. This may be explained by the influence of the energy of sputtered atoms of the Ni-catalyst [2], which exceeded 10 eV under these conditions.

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2.	Dahal A., Batzill M. Graphene-nickel interfaces: a review.// Nanoscale. – 2014. – №6. – P. 2548-2562.