“Nanostructured surfaces”
Electrochemical deposition of nanoparticles of noble metals on the silicon surface in DMSO and DMF

Shepida M.V.1, Kuntyi O.I.1, Dobrovetska O.Ya.1, Korniy S.A.2

1Lviv Polytechnic National University, 12 Bandera Str., Lviv 79013, Ukraine. 
E-mail: maryana_shepida@ukr.net
2Karpenko Physico-Mechanical Institute of the NAS of Ukraine, Lviv, 79060, Ukraine.

Electrochemical deposition is one of the methods of depositing of nanoparticles noble metal (MNPs) on the surface of silicon. The proposed work is a continuation of the systematic research of precipitation of MNPs (Ag, Au, Pd) on silicon in a non-aqueous medium (DMSO and DMF) [1]. 
The aim of the research is to determine the influence of electrolysis conditions on the geometry of MNPs. The effect of cathode potential, current density and duration of electrodeposition on the morphology of nanostructured sediments and the size of MNPs was investigated. It was established that gold (Fig. 1a) and palladium nanoparticles (Fig.1b) in the size of 50...250 nm are uniformly distributed over the surface of the silicon.

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Fig.1 SEM image of the surface of silicon with deposits of gold (a) and palladium (b), obtained in DMSO solution 4 mM HAuCl4 and 4 mM Pd(NO3)2.

During electrodeposition 2D fill of a surface of silicon occurs - from nanosized discrete particles to formation of nanostructured film it is shown.
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	1.	Kuntyi O.I., Shepida M.V., Sus L.V., Zozulya G.I., Korniy S.A. Modification of silicon surface with silver, gold and palladium nanostructures via galvanic substitution in DMSO and DMF solutions // Chem. Chem. Technol. – 2018. – 12, N 3. – P.305–309.
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