“Nanostructured surfaces”
Electrochemical deposition of nanoparticles of noble metals on the silicon surface in DMSO and DMF

Shepida M.V.1, Kuntyi O.I.1, Dobrovetska O.Ya.1, Korniy S.A.2

1Lviv Polytechnic National University, 12 Bandera Str., Lviv 79013, Ukraine. 
E-mail: maryana_shepida@ukr.net
2Karpenko Physico-Mechanical Institute of the NAS of Ukraine, Lviv, 79060, Ukraine.

Electrochemical deposition is one of the methods of depositing noble metal nanoparticles (MNPs) on the surface of silicon. The proposed work is a continuation of the systematic study of precipitation of MNPs (Ag, Au, Pd) on silicon in a non-aqueous medium (DMSO and DMF) [1]. 
The purpose of the research is to determine the influence of electrolysis conditions on the geometry of MNPs. The effect of cathode potential, current density and duration of electrodeposition on the morphology of nanostructured sediments and the size of MNPs is investigated. It was established that silicon nanoparticles (Fig. 1a) and palladium (Fig.1b) in the size 50...250 nm are uniformly distributed over the surface.

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Fig.1 SEM image of the surface of silicon with a precipitate of gold (a) and palladium (b), obtained in DMSO solution 4 mM HAuCl4 and 4 mM Pd(NO3)2.

It is shown that during electrodeposition 2D fill of a surface of silicon occurs - from nanosized discrete particles to formation of nanostructured film.
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1. Kuntyi O.I., Shepida M.V., Sus L.V., Zozulya G.I., Korniy S.A. Modification of silicon surface with silver, gold and palladium nanostructures via galvanic substitution in DMSO and DMF solutions // Chemistry & Chemical Technology. – 2018. – V.12. – P.305–309. 

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