particle
beam processes (etching and sputtering deposition) are applied to align
reactive mesogens. High quality +A, +O and +C films and their
combinations are
obtained by using these methods
O. Yaroshchuk, R. Kravchuk and O. Parri, Plasma
Beam Alignment
of Reactive Mesogens.
SID’07
Digest, pp.
694-697.pdf
