Nanocomposites and nanomaterials
Influence of heat treatment on the surface morphology of tin-doped silicon oxide films
Voitovych V.V1, Rudenko R.M1, Poroshin V. M1, Kras’ko M.M1, Kolosiuk A.G1, Povarchuk V.Yu1, Voitovych M.V2.
1Department of Solid State Electronics, Institute of Physics of the NAS of Ukraine. Prospect Nauki, 46, Kyiv-03039, Ukraine. E-mail: vvoitovych@yahoo.com
2Laskarev Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, prosp. Nauki 41, Kyiv-03028, Ukraine
The study was performed on thin non-stoichiometric films of silicon oxide (SiOx, х1.1) with a high content of tin (Sn > 2.5 atomic %). In order to segregate SiOх films into phases of silicon oxide (SiO2) and silicon, and the effect of tin on these processes, the samples were subjected to heat treatment at 900 °С for 30 minutes in an argon atmosphere. After heat treatment of the samples, an image of their surface was obtained using an electron microscope. In addition to spherical silicon tin clusters [1], filamentous connections are also observed on the film surface. Using X-ray microanalysis, it was found that such filamentous inclusions consist of atoms: С (1.44 at.%), О (62.24 at.%), Si (29.79 at.%)  та Sn (6.53 at.%). Some of the filamentous inclusions originate in large silicon-tin inclusions. 
At a temperature of 900 ° C, there is a final process of formation of amorphous nanoscale inclusions of silicon in the oxide matrix and the beginning of their crystallization, and the crystalline phase is very unstable [2]. In addition, in the process of thermally stimulated structural transformations, the films become denser. Such compaction of the film and its segregation leads to linear micro-concavities or convexities of the relief of its surface, and certain internal mechanical stresses. This compaction of the film and its separation leads to linear micro-concavities or convexities of the relief of its surface and certain internal mechanical stresses. Heat treatment of samples at a temperature of 1000 and 1100 °C renal inclusions were not observed.

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2.	Bo Yun Jang and Chang Hyun Ko. Effects of Annealing Conditions on Microstructures of Thin Film Using Crystalline Silicon Nanoparticles for Printable Electronics//J.Nanosci.Nanotechnol.-2012,-12,N2.-P. 1629-1633