“Nanostructured surfaces”
Pulse electrodeposition of noble metal nanoparticles on the silicon in DMSO and DMF solution

M.V. Shepida, O.I. Kuntyi

Lviv Polytechnic National University,
12 Bandera Str., Lviv 79013, Ukraine.
E-mail: maryana_shepida@ukr.net

Electrochemical deposition of nanoparticles of silver, gold and platinum metals (nano-M) on silicon is one of the modification methods required to create a nanostructured cream and use new resources. Electrolysis supports the ability of controlled origin geometry of nanoparticles and morphologies of nanostructures. Separately, in contrast to physical methods (thermal extraction, electron beam opening and laser treatment), it notes simply the necessary hardware and technology and is effective in the formation of protected MNP/Si systems [1, 2]. Exactly in our work the controlled production of nanoparticles of metals (Ag, Au, Pd, Pt) on reliable silicon among other aprotic workers by a method of the pulse mode of the electric power is established.
The power of nanostructured sediments from significant cathode potentials, duration of electrodeposition and concentration of ionic metals is established. It is shown that for Ecathode = -0.2… -2.5 V in a wide range of concentrations of ions   Ag (I), Au (III), Pd (II), Pt (IV) on the cream, precipitate discrete nanoparticles of metals, which are evenly applied to the substrates. Due to the nature of the semiconductor substrate, the 3D liquid of the reducing metal is made according to the project of Volmer-Weber. It is updated that during the power supply of metal nanoparticles by pulsed electrolysis, the effect of "saturation" of the cathode current for Ecathode = -1.8… -2.0 remains common. It is possible to explain the natural cream as a semiconductor, for the use of a characteristic shortage of carriers over time. The latter causes a limitation of the maximum value that occurs during electricity.
Thus, discrete metal nanoparticles and nanoporous films are formed on the surface of silicon by pulsed electrolysis in organic aprotic solvents.

1. Kelso M.V., Tubbesing J.Z., Chen Q., Switzer J.A. Epitaxial electrodeposition of chiral metal surfaces on silicon(643) // Journal of The American Chemical Society. –2018. – V. 140. – P. 15812–15819.
2. Kuntyi O., Shepida M., Dobrovetska O., Nichkalo S., Korniy S., Eliyashevskyy Yu. Pulse Electrodeposition of Palladium Nanoparticles onto Silicon in DMSO // J. Chem. – 2019. Article ID 5859204, 8 pp.