“Nanostructured surfaces”
Pulse electrodeposition of noble metal nanoparticles on the silicon in DMSO and DMF solution

M.V. Shepida, O.I. Kuntyi

Lviv Polytechnic National University,
12 Bandera Str., Lviv 79013, Ukraine.
E-mail: maryana_shepida@ukr.net

Electrochemical deposition of nanoparticles of silver, gold and platinum metals (nano-M) on silicon is one of the methods of surface modification to create silicon nanostructures and obtain materials with new properties. Electrolysis, due to the relative simplicity of hardware and technology, is effective in the formation of surface MNPs/Si systems [1, 2]. Therefore, the aim of our work is the deposition of metal nanoparticles (Ag, Au, Pd, Pt) on the surface of silicon in the environment of organic aprotic solvents by the method of pulsed electrolysis.
The dependence of the formation of nanostructured sediments on the value of the cathode potentials, the duration of electrodeposition and the concentration of metal ions has been established. It is shown that within the cathode potentials         -0.2…-2.5 V from solutions of reducing ions of a wide range of concentrations silver, gold, palladium, platinum are deposited on the silicon surface in the form of discrete nanoparticles, which are evenly distributed on the substrate surface. Therefore, due to the nature of the 3D semiconductor substrate, the growth of the renewable metal occurs according to the Volmer-Weber mechanism. It is established that during electrodeposition of metal nanoparticles by pulse electrolysis there is a peculiar effect of "saturation" of the cathode current at the value of the cathode potential -2 V. This can be explained by the nature of the silicon surface as a semiconductor characterized by a deficit of charge carriers. The latter causes a limitation of the maximum value of the cathode current during electrolysis. Therefore, the region E = -1.6… -2.5 V was chosen for the research, where there is a significant dependence of the current value on the potential.

1. Kelso M.V., Tubbesing J.Z., Chen Q., Switzer J.A. Epitaxial electrodeposition of chiral metal surfaces on silicon(643) // Journal of The American Chemical Society. –2018. – V. 140. – P. 15812–15819.
2. Kuntyi O., Shepida M., Dobrovetska O., Nichkalo S., Korniy S., Eliyashevskyy Yu. Pulse Electrodeposition of Palladium Nanoparticles onto Silicon in DMSO // J. Chem. – 2019. Article ID 5859204, 8 pp.